Исследование процессов 3D-структурирование в электронной литографии

Диссертация - Компьютеры, программирование

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. Toshio Sakamizu and Hiroshi Shiraishi. Electron-beam nanolithography and line-edge roughness of acid-breakable resin-based positive resist, vol. 61-62 <http://www.sciencedirect.com/science?_ob=PublicationURL&_tockey=TOC56572002999379999318861FLA&_cdi=5657&_pubType=J&_auth=y&_acct=C000050221&am