errors of determination are apparently minimal for Si but [7] DIN 50 438, Pt 1, p. 809 (Testing of Materials for Semi29 can be considerable for Si and Si. For development conductor Technology Determination of Impurity Content of a completely well founded IR method for determination in Semiconductors by Infrared Absorption Oxygen in Siliof carbon and oxygen impurities in mono-isotopic silicon a con), (1993).
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of mono-isotopic silicon are required first of all. These [9] Л.И. Хируненко, В.И. Шаховцов, В.И. Шинкаренко, samples could be used as the reference samples. For each Ф.М. Воробкало. ФТП, 24 (6), 1051 (1990).
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shift at 300 and 17 K have been determined.
[20] R.C. Newman. In: Infrared Studies of Crystal Defects (Tailor 3. The spectral position of Si-16O-Si band in region & Francis, London, 1973) p. 88.
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shift at 300 and 17 K has been determined. The dependence Condens Matter, 7, 7077 (1995).
of shape of asymmetric stretching vibration band of quasi28 Редактор Т.А. Полянская molecule Si-16O-28Si in spectrum of Si on spectral Физика и техника полупроводников, 2005, том 39, вып. Pages: | 1 | 2 | 3 | Книги по разным темам